Plasma tools power over 30 % of semiconductor steps, yet sub-10 nm 3-D devices demand precise control over plasma parameters that existing bulk-averaging passive sensors cannot supply. Application of available laboratory laser diagnostics to production tools is challenging due to limited optical access, background noise, reflections, complex signals, and harsh environments. We developed two compact inline systems, annular-beam confocal laser-induced fluorescence (LIF) and vortex-beam LIF, to overcome these barriers, by using structured light approach. This allows to to map densities, velocities, and fluxes of atoms, molecules, and ions toward and away from the wafer in real time through the single optical port. Both devices were tested successfully with industrial devices. The same structured-light platform can be extended to applications in plasma etch, CVD, PVD, plasma-propulsion tests, industrial gas lines, and sealed sites such as nuclear-waste cells.
Current Members
Staff Research Physicist